The following patterning (10 nm CD), metallization, wet and dry etching capabilities exist within the laboratory:
01- mask aligner (Karl Süss-MA45),
02- photoresist spinners (SPS),
03- surface profiler (Dektak 8),
04- RF magnetron sputter tool with two magnetrons (Vaksis PVD-Handy/2S),
05- wafer scriber (OEG MR200),
06- reactive ion etcher (Plasmatherm Vision 320 Mk II),
07- electrochemical deposition setups,
08- inspection microscope,
09- wet benches, laminar flow hoods and deionized water system (Köttermann-Sartorius),
10- Scanning Probe Lithography Tool (nano analytik GmbH).
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